Hyperthermal molecular beam dry etching of III-V compound semiconductors
Includes bibliographical references (p. 181-186).
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Thesis |
| Language: | eng |
| Published: |
Massachusetts Institute of Technology
2008
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/1721.1/43365 |
| _version_ | 1826193616017555456 |
|---|---|
| author | Hoshino, Isako. |
| author2 | Clifton G. Fonstad, Jr. |
| author_facet | Clifton G. Fonstad, Jr. Hoshino, Isako. |
| author_sort | Hoshino, Isako. |
| collection | MIT |
| description | Includes bibliographical references (p. 181-186). |
| first_indexed | 2024-09-23T09:41:58Z |
| format | Thesis |
| id | mit-1721.1/43365 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T09:41:58Z |
| publishDate | 2008 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/433652019-04-10T09:16:25Z Hyperthermal molecular beam dry etching of III-V compound semiconductors Hoshino, Isako. Clifton G. Fonstad, Jr. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering Materials Science and Engineering Includes bibliographical references (p. 181-186). Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1997. Vita. by Isako Hoshino. Ph.D. 2008-11-07T19:33:12Z 2008-11-07T19:33:12Z 1997 1997 Thesis http://hdl.handle.net/1721.1/43365 37525736 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 187 p. application/pdf Massachusetts Institute of Technology |
| spellingShingle | Materials Science and Engineering Hoshino, Isako. Hyperthermal molecular beam dry etching of III-V compound semiconductors |
| title | Hyperthermal molecular beam dry etching of III-V compound semiconductors |
| title_full | Hyperthermal molecular beam dry etching of III-V compound semiconductors |
| title_fullStr | Hyperthermal molecular beam dry etching of III-V compound semiconductors |
| title_full_unstemmed | Hyperthermal molecular beam dry etching of III-V compound semiconductors |
| title_short | Hyperthermal molecular beam dry etching of III-V compound semiconductors |
| title_sort | hyperthermal molecular beam dry etching of iii v compound semiconductors |
| topic | Materials Science and Engineering |
| url | http://hdl.handle.net/1721.1/43365 |
| work_keys_str_mv | AT hoshinoisako hyperthermalmolecularbeamdryetchingofiiivcompoundsemiconductors |