The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996.
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| Formato: | Tese |
| Idioma: | eng |
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Massachusetts Institute of Technology
2009
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| Acesso em linha: | http://hdl.handle.net/1721.1/47650 |