PAG segregation during exposure affecting innate material roughness
We have developed an improved AFM-based technique to measure intrinsic material roughness (IMR) after base development. We have investigated the contribution of different polymeric PAGs to IMR. These polymeric PAGs include copolymers of several styrenic PAGs with hydroxystyrene. The IMR of these pol...
| Main Authors: | , , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
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The International Society for Optical Engineering
2010
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| Online Access: | http://hdl.handle.net/1721.1/52663 |
| _version_ | 1826194057124118528 |
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| author | Pottebaum, Indira Cann, Susan G. Cabral, Alberto Astolfi, David K. Fedynyshyn, Theodore H. Roberts, Jeanette M. |
| author2 | Lincoln Laboratory |
| author_facet | Lincoln Laboratory Pottebaum, Indira Cann, Susan G. Cabral, Alberto Astolfi, David K. Fedynyshyn, Theodore H. Roberts, Jeanette M. |
| author_sort | Pottebaum, Indira |
| collection | MIT |
| description | We have developed an improved AFM-based technique to measure intrinsic material roughness (IMR) after base development. We have investigated the contribution of different polymeric PAGs to IMR. These polymeric PAGs include copolymers of several styrenic PAGs with hydroxystyrene. The IMR of these polymer-bound PAGs is reduced relative to that of their nonpolymeric counterparts with DUV exposure. Theses results represent further evidence for PAG segregation during the bake steps as being responsible for increased IMR in exposed resists, presumably by increasing the dissolution rate inhomogeneity on a nano-scale level. The work also shows that the effects of PAG segregation can be mitigated by employing polymer-bound PAGs. 2 |
| first_indexed | 2024-09-23T09:49:49Z |
| format | Article |
| id | mit-1721.1/52663 |
| institution | Massachusetts Institute of Technology |
| language | en_US |
| last_indexed | 2024-09-23T09:49:49Z |
| publishDate | 2010 |
| publisher | The International Society for Optical Engineering |
| record_format | dspace |
| spelling | mit-1721.1/526632022-09-30T17:07:02Z PAG segregation during exposure affecting innate material roughness Pottebaum, Indira Cann, Susan G. Cabral, Alberto Astolfi, David K. Fedynyshyn, Theodore H. Roberts, Jeanette M. Lincoln Laboratory Fedynyshyn, Theodore H. Pottebaum, Indira Cann, Susan G. Cabral, Alberto Astolfi, David K. Fedynyshyn, Theodore H. We have developed an improved AFM-based technique to measure intrinsic material roughness (IMR) after base development. We have investigated the contribution of different polymeric PAGs to IMR. These polymeric PAGs include copolymers of several styrenic PAGs with hydroxystyrene. The IMR of these polymer-bound PAGs is reduced relative to that of their nonpolymeric counterparts with DUV exposure. Theses results represent further evidence for PAG segregation during the bake steps as being responsible for increased IMR in exposed resists, presumably by increasing the dissolution rate inhomogeneity on a nano-scale level. The work also shows that the effects of PAG segregation can be mitigated by employing polymer-bound PAGs. 2 Lincoln Laboratory Intel Corporation 2010-03-17T16:26:20Z 2010-03-17T16:26:20Z 2009-04 Article http://purl.org/eprint/type/JournalArticle 0277-786X http://hdl.handle.net/1721.1/52663 Fedynyshyn, Theodore H. et al. “PAG segregation during exposure affecting innate material roughness.” Advances in Resist Materials and Processing Technology XXVI. Ed. Clifford L. Henderson. San Jose, CA, USA: SPIE, 2009. 727349-11. © 2009 SPIE--The International Society for Optical Engineering en_US http://dx.doi.org/10.1117/12.814811 Proceedings of SPIE Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. application/pdf The International Society for Optical Engineering SPIE |
| spellingShingle | Pottebaum, Indira Cann, Susan G. Cabral, Alberto Astolfi, David K. Fedynyshyn, Theodore H. Roberts, Jeanette M. PAG segregation during exposure affecting innate material roughness |
| title | PAG segregation during exposure affecting innate material roughness |
| title_full | PAG segregation during exposure affecting innate material roughness |
| title_fullStr | PAG segregation during exposure affecting innate material roughness |
| title_full_unstemmed | PAG segregation during exposure affecting innate material roughness |
| title_short | PAG segregation during exposure affecting innate material roughness |
| title_sort | pag segregation during exposure affecting innate material roughness |
| url | http://hdl.handle.net/1721.1/52663 |
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