High index 193 nm immersion lithography: The beginning or the end of the road

For several years, SEMATECH has invested significant effort into extending 193 nm immersion lithography by developing a set of high index materials. For high index immersion lithography (HIL) to enable 1.70NA imaging, a high index lens element with an absorbance < 0.005/cm, a fluid with an index...

Full description

Bibliographic Details
Main Authors: Zimmerman, Paul A., Rice, Bryan J., Piscani, Emil C., Liberman, Vladimir
Other Authors: Lincoln Laboratory
Format: Article
Language:en_US
Published: Society of Photo-optical Instrumentation Engineers 2010
Online Access:http://hdl.handle.net/1721.1/52703