High index 193 nm immersion lithography: The beginning or the end of the road
For several years, SEMATECH has invested significant effort into extending 193 nm immersion lithography by developing a set of high index materials. For high index immersion lithography (HIL) to enable 1.70NA imaging, a high index lens element with an absorbance < 0.005/cm, a fluid with an index...
| Main Authors: | , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
| Published: |
Society of Photo-optical Instrumentation Engineers
2010
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| Online Access: | http://hdl.handle.net/1721.1/52703 |