Nanostructures Technology, Research, and Applications

Nanostructures Technology, Research, and Applications

Pokaż inne wersje (4)

Contains reports on twenty research projects and a list of publications.

Opis bibliograficzny
Główni autorzy:	Smith, Henry I., Silverman, Scott E., Ferrera, Juan, Carter, James M., Wong, Vincent V., Gupta, Nitin, Hector, Scott D., Owen, Gabrielle M., Schattenburg, Mark L., Yang, Isabel Y., Burkhardt, Martin, Li, Huiying, Mondol, Mark K., Sission, Robert D., Moon, Euclid E., Aucoin, Richard J., Shah, Satyen N., Yasaka, Anto, Antoniadis, Dimitri A., Chu, William, Hu, Hang, Rhee, Kee, Su, Lisa T-F., Carter, David J., Kumar, Arvind, Melloch, Michael R., Orlando, Terry P., del Alamo, Jesús, Eugster, Cristopher C., Hugunin, James J., Damask, Jay N., Haus, Hermann A., Kolodziejski, Leslie A., Choi, Woo-Young, Fonstad, Clifton G., Jr., Moolji, Akbar A., Lew, Julie C., Porter, Jeanne M., Canizares, Claude R., Fleming, Robert C., Jr., Donovan, Sean M., Ismail, Khalid, Thompson, Carl V.
Format:	Technical Report
Język:	English
Wydane:	Research Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT) 2010
Hasła przedmiotowe:	Nanostructures Technology Nanostructures Research Nanostructures Applications NanoStructures Laboratory Scanning Electron-Beam Lithography Facility Spatial-Phase-Locked Electron-Beam Lithography X-Ray Nanolithography Improved Mask Technology for X-Ray Lithography High Precision Mask Alignment System Optimization of Synchrotron-Based X-ray Lithography Achromatic Holographic Lithography Ion Beam Lithography High Performance Self-aligned Sub-100 nm MOSFETs Using X-ray Lithography Fabrication of T-gate Devices Using X-ray Lithography Coulomb Charging Effects in Semiconductor Nanostructures Coulomb Charging Tunneling in Semiconductor Nanostructures Dual Electron Waveguide Device Fabricated Using X-ray Lithography Novel Mesoscopic Superconducting Devices Channel-Dropping Filters Fabricated Using X-ray Lithography Ridge-Grating Distributed-Feedback Lasers Fabricated by X-ray Lithography Fabrication of Sub-micron MSM Photodiodes by X-ray Lithography Submicrometer-Period Transmission Gratings for X-ray Spectroscopy Submicrometer-Period Transmission Gratings for X-ray Interferometry Submicrometer-Period Transmission Gratings for Atom-Beam Spectroscopy Submicrometer-Period Transmission Gratings for Atom-Beam Interferometry High-Dispersion, High Efficiency Transmission Gratings for Astrophysical X-ray Spectroscopy GaAs Epitaxy on Sawtooth-Patterned Silicon
Dostęp online:	http://hdl.handle.net/1721.1/57269

Internet

http://hdl.handle.net/1721.1/57269