Towards nanoimprint lithography-aware layout design checking

Just as the simulation of photolithography has enabled resolution-enhancement through Optical Proximity Correction, the physical simulation of nanoimprint lithography is needed to guide the design of products that will use this process. We present an extremely fast method for simulating thermal nano...

Olles dieđut

Bibliográfalaš dieđut
Váldodahkkit: Boning, Duane S., Taylor, Hayden Kingsley
Eará dahkkit: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Materiálatiipa: Artihkal
Giella:en_US
Almmustuhtton: SPIE 2010
Liŋkkat:http://hdl.handle.net/1721.1/58569
https://orcid.org/0000-0002-0417-445X