Towards nanoimprint lithography-aware layout design checking

Just as the simulation of photolithography has enabled resolution-enhancement through Optical Proximity Correction, the physical simulation of nanoimprint lithography is needed to guide the design of products that will use this process. We present an extremely fast method for simulating thermal nano...

Disgrifiad llawn

Manylion Llyfryddiaeth
Prif Awduron: Boning, Duane S., Taylor, Hayden Kingsley
Awduron Eraill: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Fformat: Erthygl
Iaith:en_US
Cyhoeddwyd: SPIE 2010
Mynediad Ar-lein:http://hdl.handle.net/1721.1/58569
https://orcid.org/0000-0002-0417-445X