Towards nanoimprint lithography-aware layout design checking

Towards nanoimprint lithography-aware layout design checking

Just as the simulation of photolithography has enabled resolution-enhancement through Optical Proximity Correction, the physical simulation of nanoimprint lithography is needed to guide the design of products that will use this process. We present an extremely fast method for simulating thermal nano...

Full description

Bibliographic Details
Main Authors: Boning, Duane S., Taylor, Hayden Kingsley
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Format: Article
Language:en_US
Published: SPIE 2010
Online Access:http://hdl.handle.net/1721.1/58569
https://orcid.org/0000-0002-0417-445X

Internet

http://hdl.handle.net/1721.1/58569
https://orcid.org/0000-0002-0417-445X

Similar Items