Towards nanoimprint lithography-aware layout design checking
Just as the simulation of photolithography has enabled resolution-enhancement through Optical Proximity Correction, the physical simulation of nanoimprint lithography is needed to guide the design of products that will use this process. We present an extremely fast method for simulating thermal nano...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
| Published: |
SPIE
2010
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| Online Access: | http://hdl.handle.net/1721.1/58569 https://orcid.org/0000-0002-0417-445X |