Fabrication and process characterization of atom transistor chips
This paper describes the design and fabrication of an atom chip for atom tunneling experiments. A fabrication process was developed that uses a combination of UV-optical and Electron-Beam lithography to pattern micrometer and nanometer scale copper wires on a single chip. The minimum wire width fabr...
Egile Nagusiak: | , , , , |
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Beste egile batzuk: | |
Formatua: | Artikulua |
Hizkuntza: | en_US |
Argitaratua: |
Institute of Electrical and Electronics Engineers
2010
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Gaiak: | |
Sarrera elektronikoa: | http://hdl.handle.net/1721.1/58962 https://orcid.org/0000-0002-9786-0538 |