Fabrication and process characterization of atom transistor chips

This paper describes the design and fabrication of an atom chip for atom tunneling experiments. A fabrication process was developed that uses a combination of UV-optical and Electron-Beam lithography to pattern micrometer and nanometer scale copper wires on a single chip. The minimum wire width fabr...

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Xehetasun bibliografikoak
Egile Nagusiak: Bright, V. M., Anderson, D. Z., Salim, E. A., Chuang, H. C., Vuletic, Vladan
Beste egile batzuk: Massachusetts Institute of Technology. Department of Physics
Formatua: Artikulua
Hizkuntza:en_US
Argitaratua: Institute of Electrical and Electronics Engineers 2010
Gaiak:
Sarrera elektronikoa:http://hdl.handle.net/1721.1/58962
https://orcid.org/0000-0002-9786-0538