Fabrication and process characterization of atom transistor chips
This paper describes the design and fabrication of an atom chip for atom tunneling experiments. A fabrication process was developed that uses a combination of UV-optical and Electron-Beam lithography to pattern micrometer and nanometer scale copper wires on a single chip. The minimum wire width fabr...
| Main Authors: | , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
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Institute of Electrical and Electronics Engineers
2010
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| Online Access: | http://hdl.handle.net/1721.1/58962 https://orcid.org/0000-0002-9786-0538 |
| _version_ | 1826193365468708864 |
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| author | Bright, V. M. Anderson, D. Z. Salim, E. A. Chuang, H. C. Vuletic, Vladan |
| author2 | Massachusetts Institute of Technology. Department of Physics |
| author_facet | Massachusetts Institute of Technology. Department of Physics Bright, V. M. Anderson, D. Z. Salim, E. A. Chuang, H. C. Vuletic, Vladan |
| author_sort | Bright, V. M. |
| collection | MIT |
| description | This paper describes the design and fabrication of an atom chip for atom tunneling experiments. A fabrication process was developed that uses a combination of UV-optical and Electron-Beam lithography to pattern micrometer and nanometer scale copper wires on a single chip. The minimum wire width fabricated in this work is 200 nm. The wires can carry current densities of more than 7.5times10[superscript 7] A/cm[superscript 2]. The electrical current tests establish the feasibility of realizing chip-based atom tunneling experiments. |
| first_indexed | 2024-09-23T09:37:55Z |
| format | Article |
| id | mit-1721.1/58962 |
| institution | Massachusetts Institute of Technology |
| language | en_US |
| last_indexed | 2024-09-23T09:37:55Z |
| publishDate | 2010 |
| publisher | Institute of Electrical and Electronics Engineers |
| record_format | dspace |
| spelling | mit-1721.1/589622022-09-26T12:45:34Z Fabrication and process characterization of atom transistor chips Bright, V. M. Anderson, D. Z. Salim, E. A. Chuang, H. C. Vuletic, Vladan Massachusetts Institute of Technology. Department of Physics MIT-Harvard Center for Ultracold Atoms Vuletic, Vladan Vuletic, Vladan Atom Chips Atom Transistor Atom Tunneling Bose-Einstein Condensation (BEC) E-Beam Lithography Suspended Nanowires This paper describes the design and fabrication of an atom chip for atom tunneling experiments. A fabrication process was developed that uses a combination of UV-optical and Electron-Beam lithography to pattern micrometer and nanometer scale copper wires on a single chip. The minimum wire width fabricated in this work is 200 nm. The wires can carry current densities of more than 7.5times10[superscript 7] A/cm[superscript 2]. The electrical current tests establish the feasibility of realizing chip-based atom tunneling experiments. 2010-10-08T14:19:00Z 2010-10-08T14:19:00Z 2009-10 Article http://purl.org/eprint/type/JournalArticle 978-1-4244-4190-7 978-1-4244-4193-8 INSPEC Accession Number: 10917191 http://hdl.handle.net/1721.1/58962 Chuang, H.C. et al. “Fabrication and process characterization of atom transistor chips.” Solid-State Sensors, Actuators and Microsystems Conference, 2009. TRANSDUCERS 2009. International. 2009. 1305-1308. © 2009 IEEE https://orcid.org/0000-0002-9786-0538 en_US http://dx.doi.org/10.1109/SENSOR.2009.5285870 Proceedings of the Solid-State Sensors, Actuators and Microsystems Conference, 2009 Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. application/pdf Institute of Electrical and Electronics Engineers IEEE |
| spellingShingle | Atom Chips Atom Transistor Atom Tunneling Bose-Einstein Condensation (BEC) E-Beam Lithography Suspended Nanowires Bright, V. M. Anderson, D. Z. Salim, E. A. Chuang, H. C. Vuletic, Vladan Fabrication and process characterization of atom transistor chips |
| title | Fabrication and process characterization of atom transistor chips |
| title_full | Fabrication and process characterization of atom transistor chips |
| title_fullStr | Fabrication and process characterization of atom transistor chips |
| title_full_unstemmed | Fabrication and process characterization of atom transistor chips |
| title_short | Fabrication and process characterization of atom transistor chips |
| title_sort | fabrication and process characterization of atom transistor chips |
| topic | Atom Chips Atom Transistor Atom Tunneling Bose-Einstein Condensation (BEC) E-Beam Lithography Suspended Nanowires |
| url | http://hdl.handle.net/1721.1/58962 https://orcid.org/0000-0002-9786-0538 |
| work_keys_str_mv | AT brightvm fabricationandprocesscharacterizationofatomtransistorchips AT andersondz fabricationandprocesscharacterizationofatomtransistorchips AT salimea fabricationandprocesscharacterizationofatomtransistorchips AT chuanghc fabricationandprocesscharacterizationofatomtransistorchips AT vuleticvladan fabricationandprocesscharacterizationofatomtransistorchips |