A hierarchical floating random walk algorithm for fabric-aware 3D capacitance extraction
With the adoption of ultra regular fabric paradigms for controlling design printability at the 22 nm node and beyond, there is an emerging need for a layout-driven, pattern-based parasitic extraction of alternative fabric layouts. In this paper, we propose a hierarchical floating random walk (HFRW)...
| Main Authors: | , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
| Published: |
Institute of Electrical and Electronics Engineers
2010
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| Subjects: | |
| Online Access: | http://hdl.handle.net/1721.1/59352 https://orcid.org/0000-0002-5880-3151 |