Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy

New TEM grids coated with ultrathin amorphous Al2O3 films have been developed using atomic layer deposition technique. The amorphous Al2O3 films can withstand temperatures over 600∘C in air and 900∘C in vacuum when the thickness of the Al2O3 film is 2 nm, and up to 1000∘C in air when the thickness i...

Ausführliche Beschreibung

Bibliographische Detailangaben
Hauptverfasser: Lan, Yucheng, Wang, Hui, Wang, Dezhi, Chen, Gang, Ren, Zhifeng
Weitere Verfasser: Massachusetts Institute of Technology. Department of Mechanical Engineering
Format: Artikel
Sprache:en_US
Veröffentlicht: Hindawi Pub. Corp. 2011
Online Zugang:http://hdl.handle.net/1721.1/61384
https://orcid.org/0000-0002-3968-8530