Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy
New TEM grids coated with ultrathin amorphous Al2O3 films have been developed using atomic layer deposition technique. The amorphous Al2O3 films can withstand temperatures over 600∘C in air and 900∘C in vacuum when the thickness of the Al2O3 film is 2 nm, and up to 1000∘C in air when the thickness i...
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Language: | en_US |
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Hindawi Pub. Corp.
2011
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Online Access: | http://hdl.handle.net/1721.1/61384 https://orcid.org/0000-0002-3968-8530 |
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author | Lan, Yucheng Wang, Hui Wang, Dezhi Chen, Gang Ren, Zhifeng |
author2 | Massachusetts Institute of Technology. Department of Mechanical Engineering |
author_facet | Massachusetts Institute of Technology. Department of Mechanical Engineering Lan, Yucheng Wang, Hui Wang, Dezhi Chen, Gang Ren, Zhifeng |
author_sort | Lan, Yucheng |
collection | MIT |
description | New TEM grids coated with ultrathin amorphous Al2O3 films have been developed using atomic layer deposition technique. The amorphous Al2O3 films can withstand temperatures over 600∘C in air and 900∘C in vacuum when the thickness of the Al2O3 film is 2 nm, and up to 1000∘C in air when the thickness is 25 nm, which makes heating TEM grids with nanoparticles up to 1000∘C in air and immediate TEM observation without interrupting the nanoparticles possible. Such coated TEM grids are very much desired for applications in high-temperature high-resolution transmission electron microscopy. |
first_indexed | 2024-09-23T13:59:50Z |
format | Article |
id | mit-1721.1/61384 |
institution | Massachusetts Institute of Technology |
language | en_US |
last_indexed | 2024-09-23T13:59:50Z |
publishDate | 2011 |
publisher | Hindawi Pub. Corp. |
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spelling | mit-1721.1/613842022-10-01T18:26:39Z Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy Lan, Yucheng Wang, Hui Wang, Dezhi Chen, Gang Ren, Zhifeng Massachusetts Institute of Technology. Department of Mechanical Engineering Chen, Gang Chen, Gang New TEM grids coated with ultrathin amorphous Al2O3 films have been developed using atomic layer deposition technique. The amorphous Al2O3 films can withstand temperatures over 600∘C in air and 900∘C in vacuum when the thickness of the Al2O3 film is 2 nm, and up to 1000∘C in air when the thickness is 25 nm, which makes heating TEM grids with nanoparticles up to 1000∘C in air and immediate TEM observation without interrupting the nanoparticles possible. Such coated TEM grids are very much desired for applications in high-temperature high-resolution transmission electron microscopy. 2011-03-03T17:57:58Z 2011-03-03T17:57:58Z 2010-06 2010-05 Article http://purl.org/eprint/type/JournalArticle 1687-9503 http://hdl.handle.net/1721.1/61384 Lan, Yucheng, et al. “Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy,” Journal of Nanotechnology, vol. 2010, Article ID 279608, 6 pages, 2010. © 2010 Hindawi Publishing Corporation. https://orcid.org/0000-0002-3968-8530 en_US http://dx.doi.org/10.1155/2010/279608 Journal of Nanotechnology Creative Commons Attribution http://creativecommons.org/licenses/by/2.0/ application/pdf Hindawi Pub. Corp. Hindawi |
spellingShingle | Lan, Yucheng Wang, Hui Wang, Dezhi Chen, Gang Ren, Zhifeng Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy |
title | Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy |
title_full | Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy |
title_fullStr | Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy |
title_full_unstemmed | Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy |
title_short | Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy |
title_sort | grids for applications in high temperature high resolution transmission electron microscopy |
url | http://hdl.handle.net/1721.1/61384 https://orcid.org/0000-0002-3968-8530 |
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