Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy

New TEM grids coated with ultrathin amorphous Al2O3 films have been developed using atomic layer deposition technique. The amorphous Al2O3 films can withstand temperatures over 600∘C in air and 900∘C in vacuum when the thickness of the Al2O3 film is 2 nm, and up to 1000∘C in air when the thickness i...

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Main Authors: Lan, Yucheng, Wang, Hui, Wang, Dezhi, Chen, Gang, Ren, Zhifeng
Other Authors: Massachusetts Institute of Technology. Department of Mechanical Engineering
Format: Article
Language:en_US
Published: Hindawi Pub. Corp. 2011
Online Access:http://hdl.handle.net/1721.1/61384
https://orcid.org/0000-0002-3968-8530
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author Lan, Yucheng
Wang, Hui
Wang, Dezhi
Chen, Gang
Ren, Zhifeng
author2 Massachusetts Institute of Technology. Department of Mechanical Engineering
author_facet Massachusetts Institute of Technology. Department of Mechanical Engineering
Lan, Yucheng
Wang, Hui
Wang, Dezhi
Chen, Gang
Ren, Zhifeng
author_sort Lan, Yucheng
collection MIT
description New TEM grids coated with ultrathin amorphous Al2O3 films have been developed using atomic layer deposition technique. The amorphous Al2O3 films can withstand temperatures over 600∘C in air and 900∘C in vacuum when the thickness of the Al2O3 film is 2 nm, and up to 1000∘C in air when the thickness is 25 nm, which makes heating TEM grids with nanoparticles up to 1000∘C in air and immediate TEM observation without interrupting the nanoparticles possible. Such coated TEM grids are very much desired for applications in high-temperature high-resolution transmission electron microscopy.
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spelling mit-1721.1/613842022-10-01T18:26:39Z Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy Lan, Yucheng Wang, Hui Wang, Dezhi Chen, Gang Ren, Zhifeng Massachusetts Institute of Technology. Department of Mechanical Engineering Chen, Gang Chen, Gang New TEM grids coated with ultrathin amorphous Al2O3 films have been developed using atomic layer deposition technique. The amorphous Al2O3 films can withstand temperatures over 600∘C in air and 900∘C in vacuum when the thickness of the Al2O3 film is 2 nm, and up to 1000∘C in air when the thickness is 25 nm, which makes heating TEM grids with nanoparticles up to 1000∘C in air and immediate TEM observation without interrupting the nanoparticles possible. Such coated TEM grids are very much desired for applications in high-temperature high-resolution transmission electron microscopy. 2011-03-03T17:57:58Z 2011-03-03T17:57:58Z 2010-06 2010-05 Article http://purl.org/eprint/type/JournalArticle 1687-9503 http://hdl.handle.net/1721.1/61384 Lan, Yucheng, et al. “Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy,” Journal of Nanotechnology, vol. 2010, Article ID 279608, 6 pages, 2010. © 2010 Hindawi Publishing Corporation. https://orcid.org/0000-0002-3968-8530 en_US http://dx.doi.org/10.1155/2010/279608 Journal of Nanotechnology Creative Commons Attribution http://creativecommons.org/licenses/by/2.0/ application/pdf Hindawi Pub. Corp. Hindawi
spellingShingle Lan, Yucheng
Wang, Hui
Wang, Dezhi
Chen, Gang
Ren, Zhifeng
Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy
title Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy
title_full Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy
title_fullStr Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy
title_full_unstemmed Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy
title_short Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy
title_sort grids for applications in high temperature high resolution transmission electron microscopy
url http://hdl.handle.net/1721.1/61384
https://orcid.org/0000-0002-3968-8530
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