A feature-to-wafer-scale model of etch-rate non-uniformity in deep reactive ion etching/

Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2010.

Bibliographic Details
Main Author:	Diaz, Jaime O. (Jaime Oscar Diaz Villamil)
Other Authors:	Duane S. Boning.
Format:	Thesis
Language:	eng
Published:	Massachusetts Institute of Technology 2011
Subjects:	Electrical Engineering and Computer Science.
Online Access:	http://hdl.handle.net/1721.1/61572

Internet

http://hdl.handle.net/1721.1/61572