A feature-to-wafer-scale model of etch-rate non-uniformity in deep reactive ion etching/

A feature-to-wafer-scale model of etch-rate non-uniformity in deep reactive ion etching/

Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2010.

Bibliographic Details
Main Author: Diaz, Jaime O. (Jaime Oscar Diaz Villamil)
Other Authors: Duane S. Boning.
Format: Thesis
Language:eng
Published: Massachusetts Institute of Technology 2011
Subjects:
Electrical Engineering and Computer Science.
Online Access:http://hdl.handle.net/1721.1/61572

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