Dislocation mechanism of interface point defect migration
Vacancies and interstitials absorbed at Cu-Nb interfaces are shown to migrate by a multistage process involving the thermally-activated formation, motion, and annihilation of kinks and jogs on interface misfit dislocations. This mechanism, including the energy along the entire migration path, can be...
Main Authors: | , |
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Other Authors: | |
Format: | Article |
Language: | en_US |
Published: |
American Physical Society
2011
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Online Access: | http://hdl.handle.net/1721.1/62855 https://orcid.org/0000-0003-3949-0441 |