Loop flattening & spherical sampling: Highly efficient model reduction techniques for SRAM yield analysis
The impact of process variation in deep-submicron technologies is especially pronounced for SRAM architectures which must meet demands for higher density and higher performance at increased levels of integration. Due to the complex structure of SRAM, estimating the effect of process variation accura...
| Main Authors: | , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
| Published: |
Institute of Electrical and Electronics Engineers
2011
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| Online Access: | http://hdl.handle.net/1721.1/63115 https://orcid.org/0000-0002-5977-2748 https://orcid.org/0000-0003-0737-3259 |