Breaking the Far-Field Diffraction Limit in Optical Nanopatterning via Repeated Photochemical and Electrochemical Transitions in Photochromic Molecules

Breaking the Far-Field Diffraction Limit in Optical Nanopatterning via Repeated Photochemical and Electrochemical Transitions in Photochromic Molecules

By saturating a photochromic transition with a nodal illumination (wavelength, λ), one isomeric form of a small molecule is spatially localized to a region smaller than the far-field diffraction limit. A selective oxidation step effectively locks this pattern allowing repeated patterning. Using this...

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Bibliographic Details
Main Authors: Brimhall, Nicole, Manthena, Rajakumar Varma, Menon, Rajesh, Andrew, Trisha Lionel
Other Authors: Massachusetts Institute of Technology. Department of Chemistry
Format: Article
Language:en_US
Published: American Physical Society (APS) 2012
Online Access:http://hdl.handle.net/1721.1/69842

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http://hdl.handle.net/1721.1/69842

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