Characterization and analysis of process variability in deeply-scaled MOSFETs
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2012.
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| Format: | Thesis |
| Language: | eng |
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Massachusetts Institute of Technology
2012
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| Online Access: | http://hdl.handle.net/1721.1/70787 |
| _version_ | 1826215512623808512 |
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| author | Balakrishnan, Karthik, Ph. D. Massachusetts Institute of Technology |
| author2 | Duane S. Boning. |
| author_facet | Duane S. Boning. Balakrishnan, Karthik, Ph. D. Massachusetts Institute of Technology |
| author_sort | Balakrishnan, Karthik, Ph. D. Massachusetts Institute of Technology |
| collection | MIT |
| description | Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2012. |
| first_indexed | 2024-09-23T16:32:36Z |
| format | Thesis |
| id | mit-1721.1/70787 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T16:32:36Z |
| publishDate | 2012 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/707872019-04-12T15:37:07Z Characterization and analysis of process variability in deeply-scaled MOSFETs Balakrishnan, Karthik, Ph. D. Massachusetts Institute of Technology Duane S. Boning. Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. Electrical Engineering and Computer Science. Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2012. Cataloged from PDF version of thesis. Includes bibliographical references (p. 137-147). Variability characterization and analysis in advanced technologies are needed to ensure robust performance as well as improved process capability. This thesis presents a framework for device variability characterization and analysis. Test structure and test circuit design, identification of significant effects in design of experiments, and decomposition approaches to quantify variation and its sources are explored. Two examples of transistor variability characterization are discussed: contact plug resistance variation within the context of a transistor, and AC, or short time-scale, variation in transistors. Results show that, with careful test structure and circuit design and ample measurement data, interesting trends can be observed. Among these trends are (1) a distinct within-die spatial signature of contact plug resistance and (2) a picosecond-accuracy delay measurement on transistors which reveals the presence of excessive external parasitic gate resistance. Measurement results obtained from these test vehicles can aid in both the understanding of variations in the fabrication process and in efforts to model variations in transistor behavior. by Karthik Balakrishnan. Ph.D. 2012-05-15T21:12:28Z 2012-05-15T21:12:28Z 2012 2012 Thesis http://hdl.handle.net/1721.1/70787 792745892 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 147 p. application/pdf Massachusetts Institute of Technology |
| spellingShingle | Electrical Engineering and Computer Science. Balakrishnan, Karthik, Ph. D. Massachusetts Institute of Technology Characterization and analysis of process variability in deeply-scaled MOSFETs |
| title | Characterization and analysis of process variability in deeply-scaled MOSFETs |
| title_full | Characterization and analysis of process variability in deeply-scaled MOSFETs |
| title_fullStr | Characterization and analysis of process variability in deeply-scaled MOSFETs |
| title_full_unstemmed | Characterization and analysis of process variability in deeply-scaled MOSFETs |
| title_short | Characterization and analysis of process variability in deeply-scaled MOSFETs |
| title_sort | characterization and analysis of process variability in deeply scaled mosfets |
| topic | Electrical Engineering and Computer Science. |
| url | http://hdl.handle.net/1721.1/70787 |
| work_keys_str_mv | AT balakrishnankarthikphdmassachusettsinstituteoftechnology characterizationandanalysisofprocessvariabilityindeeplyscaledmosfets |