Design and Fabrication of DRIE-Patterned Complex Needlelike Silicon Structures

This paper reports the design and fabrication of high-aspect-ratio needlelike silicon structures that can have complex geometry. The structures are hundreds of micrometers tall with submicrometer-sharp protrusions, and they are fabricated using a series of passivated and unpassivated deep reactive-i...

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Bibliographic Details
Main Authors: Gassend, Blaise, Velasquez-Garcia, Luis Fernando, Akinwande, Akintunde Ibitayo
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Format: Article
Language:en_US
Published: Institute of Electrical and Electronics Engineers 2012
Online Access:http://hdl.handle.net/1721.1/70936
https://orcid.org/0000-0003-3001-9223