Design and Fabrication of DRIE-Patterned Complex Needlelike Silicon Structures
This paper reports the design and fabrication of high-aspect-ratio needlelike silicon structures that can have complex geometry. The structures are hundreds of micrometers tall with submicrometer-sharp protrusions, and they are fabricated using a series of passivated and unpassivated deep reactive-i...
| Main Authors: | , , |
|---|---|
| Other Authors: | |
| Format: | Article |
| Language: | en_US |
| Published: |
Institute of Electrical and Electronics Engineers
2012
|
| Online Access: | http://hdl.handle.net/1721.1/70936 https://orcid.org/0000-0003-3001-9223 |
| _version_ | 1811089412331667456 |
|---|---|
| author | Gassend, Blaise Velasquez-Garcia, Luis Fernando Akinwande, Akintunde Ibitayo |
| author2 | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science |
| author_facet | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Gassend, Blaise Velasquez-Garcia, Luis Fernando Akinwande, Akintunde Ibitayo |
| author_sort | Gassend, Blaise |
| collection | MIT |
| description | This paper reports the design and fabrication of high-aspect-ratio needlelike silicon structures that can have complex geometry. The structures are hundreds of micrometers tall with submicrometer-sharp protrusions, and they are fabricated using a series of passivated and unpassivated deep reactive-ion etching (DRIE) steps. A simple model is presented to predict the geometry of the structure based on the etch mask and the etch sequence. Model predictions are in good qualitative agreement with fabrication results, making it a useful design tool. The model is compared with literature reports on tapered DRIE. |
| first_indexed | 2024-09-23T14:18:46Z |
| format | Article |
| id | mit-1721.1/70936 |
| institution | Massachusetts Institute of Technology |
| language | en_US |
| last_indexed | 2024-09-23T14:18:46Z |
| publishDate | 2012 |
| publisher | Institute of Electrical and Electronics Engineers |
| record_format | dspace |
| spelling | mit-1721.1/709362022-10-01T20:30:49Z Design and Fabrication of DRIE-Patterned Complex Needlelike Silicon Structures Gassend, Blaise Velasquez-Garcia, Luis Fernando Akinwande, Akintunde Ibitayo Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Massachusetts Institute of Technology. Microsystems Technology Laboratories Akinwande, Akintunde Ibitayo Gassend, Blaise Velasquez-Garcia, Luis Fernando Akinwande, Akintunde Ibitayo This paper reports the design and fabrication of high-aspect-ratio needlelike silicon structures that can have complex geometry. The structures are hundreds of micrometers tall with submicrometer-sharp protrusions, and they are fabricated using a series of passivated and unpassivated deep reactive-ion etching (DRIE) steps. A simple model is presented to predict the geometry of the structure based on the etch mask and the etch sequence. Model predictions are in good qualitative agreement with fabrication results, making it a useful design tool. The model is compared with literature reports on tapered DRIE. United States. National Aeronautics and Space Administration (Space and Naval Warfare Systems Center Award N66001-04-1-8925) Space and Naval Warfare Systems Center San Diego (U.S.) (Award N66001-04-1-8925) United States. Army (Soldiers Systems Command Award W911QY-05-1-0002) 2012-05-24T20:02:22Z 2012-05-24T20:02:22Z 2010-06 2009-10 Article http://purl.org/eprint/type/JournalArticle 1057-7157 INSPEC Accession Number: 11328192 http://hdl.handle.net/1721.1/70936 Gassend, Blaise Laurent Patrick, Luis Fernando Velasquez-Garcia, and Akintunde Ibitayo Akinwande. “Design and Fabrication of DRIE-Patterned Complex Needlelike Silicon Structures.” Journal of Microelectromechanical Systems 19.3 (2010): 589–598. Web.© 2010 IEEE. https://orcid.org/0000-0003-3001-9223 en_US http://dx.doi.org/10.1109/JMEMS.2010.2042680 Journal of Microelectromechanical Systems Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. application/pdf Institute of Electrical and Electronics Engineers IEEE |
| spellingShingle | Gassend, Blaise Velasquez-Garcia, Luis Fernando Akinwande, Akintunde Ibitayo Design and Fabrication of DRIE-Patterned Complex Needlelike Silicon Structures |
| title | Design and Fabrication of DRIE-Patterned Complex Needlelike Silicon Structures |
| title_full | Design and Fabrication of DRIE-Patterned Complex Needlelike Silicon Structures |
| title_fullStr | Design and Fabrication of DRIE-Patterned Complex Needlelike Silicon Structures |
| title_full_unstemmed | Design and Fabrication of DRIE-Patterned Complex Needlelike Silicon Structures |
| title_short | Design and Fabrication of DRIE-Patterned Complex Needlelike Silicon Structures |
| title_sort | design and fabrication of drie patterned complex needlelike silicon structures |
| url | http://hdl.handle.net/1721.1/70936 https://orcid.org/0000-0003-3001-9223 |
| work_keys_str_mv | AT gassendblaise designandfabricationofdriepatternedcomplexneedlelikesiliconstructures AT velasquezgarcialuisfernando designandfabricationofdriepatternedcomplexneedlelikesiliconstructures AT akinwandeakintundeibitayo designandfabricationofdriepatternedcomplexneedlelikesiliconstructures |