Large-area and high-resolution distortion measurement based on moire fringe method for hot embossing process
A moiré fringe approach is developed to identify simultaneously the global and local distortions in hot-embossed polymeric samples. A square grid pattern with a pitch of 63.5 μm is hot-embossed on the polymer substrate. When a reference grid, a polymeric film with the same pattern, is placed on top...
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Language: | en_US |
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Optical Society of America
2012
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Online Access: | http://hdl.handle.net/1721.1/71162 https://orcid.org/0000-0002-0417-445X |
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author | Boning, Duane S. Taylor, Hayden Kingsley Youcef-Toumi, Kamal Xu, Zhiguang Yoon, Soon Fatt |
author2 | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science |
author_facet | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Boning, Duane S. Taylor, Hayden Kingsley Youcef-Toumi, Kamal Xu, Zhiguang Yoon, Soon Fatt |
author_sort | Boning, Duane S. |
collection | MIT |
description | A moiré fringe approach is developed to identify simultaneously the global and local distortions in hot-embossed polymeric samples. A square grid pattern with a pitch of 63.5 μm is hot-embossed on the polymer substrate. When a reference grid, a polymeric film with the same pattern, is placed on top of the sample, a moiré fringe pattern is observed and recorded by a document scanner. The deviation of the intersections of the fringes from their ideal positions presents the residual distortion in the sample. With different sample-reference rotation angles eight images are acquired for the same sample to achieve the optimal result by a data fitting technique. The validity of this method is proved by the self-consistency of the results from the eight images. To the best of our knowledge, this is the first time distortion quantification has been achieved both in a large area up to that of a scanner and with a high resolution at the level of 1 μm. Furthermore, we do not use any expensive instrument, nor need to measure the sample–reference rotation angle or position the sample precisely, and the process is run automatically by a computer instead of manual operation. |
first_indexed | 2024-09-23T14:49:26Z |
format | Article |
id | mit-1721.1/71162 |
institution | Massachusetts Institute of Technology |
language | en_US |
last_indexed | 2024-09-23T14:49:26Z |
publishDate | 2012 |
publisher | Optical Society of America |
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spelling | mit-1721.1/711622022-10-01T22:42:26Z Large-area and high-resolution distortion measurement based on moire fringe method for hot embossing process Boning, Duane S. Taylor, Hayden Kingsley Youcef-Toumi, Kamal Xu, Zhiguang Yoon, Soon Fatt Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Massachusetts Institute of Technology. Department of Mechanical Engineering Boning, Duane S. Boning, Duane S. Taylor, Hayden Kingsley Youcef-Toumi, Kamal Xu, Zhiguang A moiré fringe approach is developed to identify simultaneously the global and local distortions in hot-embossed polymeric samples. A square grid pattern with a pitch of 63.5 μm is hot-embossed on the polymer substrate. When a reference grid, a polymeric film with the same pattern, is placed on top of the sample, a moiré fringe pattern is observed and recorded by a document scanner. The deviation of the intersections of the fringes from their ideal positions presents the residual distortion in the sample. With different sample-reference rotation angles eight images are acquired for the same sample to achieve the optimal result by a data fitting technique. The validity of this method is proved by the self-consistency of the results from the eight images. To the best of our knowledge, this is the first time distortion quantification has been achieved both in a large area up to that of a scanner and with a high resolution at the level of 1 μm. Furthermore, we do not use any expensive instrument, nor need to measure the sample–reference rotation angle or position the sample precisely, and the process is run automatically by a computer instead of manual operation. Singapore-MIT Alliance 2012-06-15T13:31:57Z 2012-06-15T13:31:57Z 2009-09 2009-07 Article http://purl.org/eprint/type/JournalArticle 1094-4087 http://hdl.handle.net/1721.1/71162 Xu, Zhiguang et al. “Large-area and High-resolution Distortion Measurement Based on Moiré Fringe Method for Hot Embossing Process.” Optics Express 17.21 (2009): 18394. © Copyright 2009 The Optical Society https://orcid.org/0000-0002-0417-445X en_US http://dx.doi.org/10.1364/OE.17.018394 Optics Express Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. application/pdf Optical Society of America MIT web domain |
spellingShingle | Boning, Duane S. Taylor, Hayden Kingsley Youcef-Toumi, Kamal Xu, Zhiguang Yoon, Soon Fatt Large-area and high-resolution distortion measurement based on moire fringe method for hot embossing process |
title | Large-area and high-resolution distortion measurement based on moire fringe method for hot embossing process |
title_full | Large-area and high-resolution distortion measurement based on moire fringe method for hot embossing process |
title_fullStr | Large-area and high-resolution distortion measurement based on moire fringe method for hot embossing process |
title_full_unstemmed | Large-area and high-resolution distortion measurement based on moire fringe method for hot embossing process |
title_short | Large-area and high-resolution distortion measurement based on moire fringe method for hot embossing process |
title_sort | large area and high resolution distortion measurement based on moire fringe method for hot embossing process |
url | http://hdl.handle.net/1721.1/71162 https://orcid.org/0000-0002-0417-445X |
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