Low-cost interference lithography
The authors report demonstration of a low-cost ( ∼ 1000 USD) interference lithography system based on a Lloyd’s mirror interferometer that is capable of ∼ 300 nm pitch patterning. The components include only a 405 nm GaN diode-laser module, a machinist’s block, a chrome-coated silicon mirror, substr...
| Main Authors: | , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
| Published: |
American Vacuum Society (AVS)
2012
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| Online Access: | http://hdl.handle.net/1721.1/73454 https://orcid.org/0000-0002-8657-8537 https://orcid.org/0000-0001-7453-9031 |