Low-cost interference lithography
The authors report demonstration of a low-cost ( ∼ 1000 USD) interference lithography system based on a Lloyd’s mirror interferometer that is capable of ∼ 300 nm pitch patterning. The components include only a 405 nm GaN diode-laser module, a machinist’s block, a chrome-coated silicon mirror, substr...
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
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American Vacuum Society (AVS)
2012
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| Online Access: | http://hdl.handle.net/1721.1/73454 https://orcid.org/0000-0002-8657-8537 https://orcid.org/0000-0001-7453-9031 |
| _version_ | 1826191897350111232 |
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| author | Fucetola, Corey P. Korre, Hasan Berggren, Karl K. |
| author2 | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science |
| author_facet | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Fucetola, Corey P. Korre, Hasan Berggren, Karl K. |
| author_sort | Fucetola, Corey P. |
| collection | MIT |
| description | The authors report demonstration of a low-cost ( ∼ 1000 USD) interference lithography system based on a Lloyd’s mirror interferometer that is capable of ∼ 300 nm pitch patterning. The components include only a 405 nm GaN diode-laser module, a machinist’s block, a chrome-coated silicon mirror, substrate, and double-sided carbon scanning electron microscopy (SEM) tape. The laser and the machinist’s block were assembled in a linear configuration, and to complete the system, the mirror and substrate were taped to perpendicular surfaces of the machinist’s block. Approximately 50 silicon substrates were prepared, exposed, and developed, after which some were inspected in a SEM. The associated laser spectrum was also measured, enabling calculation of the laser’s fringe visibility as it varied along the substrate surface. To compare the exposed resist pattern to the fringe visibility, the authors measured the first order diffraction efficiency as a function of position along the grating surface. Their measurements indicated that artifacts seen in both the optical spectrum and resulting grating patterns arose from the laser diode source, thus improving the source characteristics will be the topic of future work. |
| first_indexed | 2024-09-23T09:03:00Z |
| format | Article |
| id | mit-1721.1/73454 |
| institution | Massachusetts Institute of Technology |
| language | en_US |
| last_indexed | 2024-09-23T09:03:00Z |
| publishDate | 2012 |
| publisher | American Vacuum Society (AVS) |
| record_format | dspace |
| spelling | mit-1721.1/734542022-09-26T10:05:37Z Low-cost interference lithography Fucetola, Corey P. Korre, Hasan Berggren, Karl K. Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Massachusetts Institute of Technology. Research Laboratory of Electronics Fucetola, Corey P. Korre, Hasan Berggren, Karl K. The authors report demonstration of a low-cost ( ∼ 1000 USD) interference lithography system based on a Lloyd’s mirror interferometer that is capable of ∼ 300 nm pitch patterning. The components include only a 405 nm GaN diode-laser module, a machinist’s block, a chrome-coated silicon mirror, substrate, and double-sided carbon scanning electron microscopy (SEM) tape. The laser and the machinist’s block were assembled in a linear configuration, and to complete the system, the mirror and substrate were taped to perpendicular surfaces of the machinist’s block. Approximately 50 silicon substrates were prepared, exposed, and developed, after which some were inspected in a SEM. The associated laser spectrum was also measured, enabling calculation of the laser’s fringe visibility as it varied along the substrate surface. To compare the exposed resist pattern to the fringe visibility, the authors measured the first order diffraction efficiency as a function of position along the grating surface. Their measurements indicated that artifacts seen in both the optical spectrum and resulting grating patterns arose from the laser diode source, thus improving the source characteristics will be the topic of future work. Singapore-MIT Alliance for Research and Technology 2012-09-27T21:26:49Z 2012-09-27T21:26:49Z 2009-12 Article http://purl.org/eprint/type/JournalArticle 1071-1023 1520-8567 http://hdl.handle.net/1721.1/73454 Fucetola, Corey P., Hasan Korre, and Karl K. Berggren. “Low-cost interference lithography.” Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 27.6 (2009): 2958. © 2009 American Vacuum Society https://orcid.org/0000-0002-8657-8537 https://orcid.org/0000-0001-7453-9031 en_US http://dx.doi.org/10.1116/1.3245990 Journal of Vacuum Science & Technology B Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. application/pdf American Vacuum Society (AVS) MIT web domain |
| spellingShingle | Fucetola, Corey P. Korre, Hasan Berggren, Karl K. Low-cost interference lithography |
| title | Low-cost interference lithography |
| title_full | Low-cost interference lithography |
| title_fullStr | Low-cost interference lithography |
| title_full_unstemmed | Low-cost interference lithography |
| title_short | Low-cost interference lithography |
| title_sort | low cost interference lithography |
| url | http://hdl.handle.net/1721.1/73454 https://orcid.org/0000-0002-8657-8537 https://orcid.org/0000-0001-7453-9031 |
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