Low-cost interference lithography
The authors report demonstration of a low-cost ( ∼ 1000 USD) interference lithography system based on a Lloyd’s mirror interferometer that is capable of ∼ 300 nm pitch patterning. The components include only a 405 nm GaN diode-laser module, a machinist’s block, a chrome-coated silicon mirror, substr...
Main Authors: | Fucetola, Corey P., Korre, Hasan, Berggren, Karl K. |
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Other Authors: | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science |
Format: | Article |
Language: | en_US |
Published: |
American Vacuum Society (AVS)
2012
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Online Access: | http://hdl.handle.net/1721.1/73454 https://orcid.org/0000-0002-8657-8537 https://orcid.org/0000-0001-7453-9031 |
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