Preliminary Characterisation of Low-Temperature Bonded Copper Interconnects for 3-D Integrated Circuits

Three dimensional (3-D) integrated circuits can be fabricated by bonding previously processed device layers using metal-metal bonds that also serve as layer-to-layer interconnects. Bonded copper interconnects test structures were created by thermocompression bonding and the bond toughness was measur...

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Main Authors: Leong, Hoi Liong, Gan, C.L., Pey, Kin Leong, Tsang, Chi-fo, Thompson, Carl V., Hongyu, Li
Format: Article
Language:English
Published: 2004
Subjects:
Online Access:http://hdl.handle.net/1721.1/7372
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author Leong, Hoi Liong
Gan, C.L.
Pey, Kin Leong
Tsang, Chi-fo
Thompson, Carl V.
Hongyu, Li
author_facet Leong, Hoi Liong
Gan, C.L.
Pey, Kin Leong
Tsang, Chi-fo
Thompson, Carl V.
Hongyu, Li
author_sort Leong, Hoi Liong
collection MIT
description Three dimensional (3-D) integrated circuits can be fabricated by bonding previously processed device layers using metal-metal bonds that also serve as layer-to-layer interconnects. Bonded copper interconnects test structures were created by thermocompression bonding and the bond toughness was measured using the four-point test. The effects of bonding temperature, physical bonding and failure mechanisms were investigated. The surface effects on copper surface due to pre-bond clean (with glacial acetic acid) were also looked into. A maximum average bond toughness of approximately 35 J/m² was obtained bonding temperature 300 C.
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spelling mit-1721.1/73722019-04-12T08:39:34Z Preliminary Characterisation of Low-Temperature Bonded Copper Interconnects for 3-D Integrated Circuits Leong, Hoi Liong Gan, C.L. Pey, Kin Leong Tsang, Chi-fo Thompson, Carl V. Hongyu, Li three dimensional integrated circuits bonded copper interconnects bonding fabrication Three dimensional (3-D) integrated circuits can be fabricated by bonding previously processed device layers using metal-metal bonds that also serve as layer-to-layer interconnects. Bonded copper interconnects test structures were created by thermocompression bonding and the bond toughness was measured using the four-point test. The effects of bonding temperature, physical bonding and failure mechanisms were investigated. The surface effects on copper surface due to pre-bond clean (with glacial acetic acid) were also looked into. A maximum average bond toughness of approximately 35 J/m² was obtained bonding temperature 300 C. Singapore-MIT Alliance (SMA) 2004-12-10T14:24:14Z 2004-12-10T14:24:14Z 2005-01 Article http://hdl.handle.net/1721.1/7372 en Advanced Materials for Micro- and Nano-Systems (AMMNS); 11870 bytes application/pdf application/pdf
spellingShingle three dimensional integrated circuits
bonded copper interconnects
bonding
fabrication
Leong, Hoi Liong
Gan, C.L.
Pey, Kin Leong
Tsang, Chi-fo
Thompson, Carl V.
Hongyu, Li
Preliminary Characterisation of Low-Temperature Bonded Copper Interconnects for 3-D Integrated Circuits
title Preliminary Characterisation of Low-Temperature Bonded Copper Interconnects for 3-D Integrated Circuits
title_full Preliminary Characterisation of Low-Temperature Bonded Copper Interconnects for 3-D Integrated Circuits
title_fullStr Preliminary Characterisation of Low-Temperature Bonded Copper Interconnects for 3-D Integrated Circuits
title_full_unstemmed Preliminary Characterisation of Low-Temperature Bonded Copper Interconnects for 3-D Integrated Circuits
title_short Preliminary Characterisation of Low-Temperature Bonded Copper Interconnects for 3-D Integrated Circuits
title_sort preliminary characterisation of low temperature bonded copper interconnects for 3 d integrated circuits
topic three dimensional integrated circuits
bonded copper interconnects
bonding
fabrication
url http://hdl.handle.net/1721.1/7372
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