Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist

Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist

A scanning-helium-ion-beam microscope is now commercially available. This microscope can be used to perform lithography similar to, but of potentially higher resolution than, scanning electron-beam lithography. This article describes the control of this microscope for lithography via beam steering/b...

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Bibliographic Details
Main Authors: Winston, Donald, Cord, Bryan M., Ming, B., Bell, David C., DiNatale, W. F., Stern, L. A., Vladar, A. E., Postek, M. T., Mondol, Mark K., Yang, Joel K. W., Berggren, Karl K.
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Format: Article
Language:en_US
Published: American Vacuum Society (AVS) 2012
Online Access:http://hdl.handle.net/1721.1/74106
https://orcid.org/0000-0002-3031-4890
https://orcid.org/0000-0001-7453-9031

Internet

http://hdl.handle.net/1721.1/74106
https://orcid.org/0000-0002-3031-4890
https://orcid.org/0000-0001-7453-9031

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