Development of a simple, compact, low-cost interference lithography system
Interference lithography (IL) has proven itself to be an enabling technology for nanofabrication. Within IL, issues of spatial phase distortion, fringe stability, and substrate development have been explored and addressed. However, IL tools are still unnecessarily expensive, large, and complex. To a...
| Main Authors: | , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
| Published: |
American Vacuum Society (AVS)
2012
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| Online Access: | http://hdl.handle.net/1721.1/74116 https://orcid.org/0000-0002-8657-8537 https://orcid.org/0000-0001-7453-9031 https://orcid.org/0000-0001-9157-6491 |