Development of a simple, compact, low-cost interference lithography system
Interference lithography (IL) has proven itself to be an enabling technology for nanofabrication. Within IL, issues of spatial phase distortion, fringe stability, and substrate development have been explored and addressed. However, IL tools are still unnecessarily expensive, large, and complex. To a...
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| Format: | Article |
| Language: | en_US |
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American Vacuum Society (AVS)
2012
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| Online Access: | http://hdl.handle.net/1721.1/74116 https://orcid.org/0000-0002-8657-8537 https://orcid.org/0000-0001-7453-9031 https://orcid.org/0000-0001-9157-6491 |
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| author | Korre, Hasan Fucetola, Corey P. Johnson, Jeremiah A. Berggren, Karl K. |
| author2 | Massachusetts Institute of Technology. Department of Chemistry |
| author_facet | Massachusetts Institute of Technology. Department of Chemistry Korre, Hasan Fucetola, Corey P. Johnson, Jeremiah A. Berggren, Karl K. |
| author_sort | Korre, Hasan |
| collection | MIT |
| description | Interference lithography (IL) has proven itself to be an enabling technology for nanofabrication. Within IL, issues of spatial phase distortion, fringe stability, and substrate development have been explored and addressed. However, IL tools are still unnecessarily expensive, large, and complex. To address these issues, the authors previously built a simple IL tool that used a blue laser diode to produce ∼ 300 nm pitch structures. The resulting patterned areas ( ∼ mm[superscript 2]) were limited by both the temporal and spatial coherence of the laser. Here, the authors report on the advancement of their low-cost interference lithography tool that makes use of newly available blue laser diodes and a simplified spatial filter to print larger-area ( ∼ cm[superscript 2]) patterns. With this configuration, the authors have designed and implemented a small-footprint ( ∼ 0.2 m[superscript 2]) Lloyd’s mirror IL tool that can be assembled for less than ∼ 6000 USD. |
| first_indexed | 2024-09-23T14:14:36Z |
| format | Article |
| id | mit-1721.1/74116 |
| institution | Massachusetts Institute of Technology |
| language | en_US |
| last_indexed | 2024-09-23T14:14:36Z |
| publishDate | 2012 |
| publisher | American Vacuum Society (AVS) |
| record_format | dspace |
| spelling | mit-1721.1/741162022-10-01T20:01:50Z Development of a simple, compact, low-cost interference lithography system Korre, Hasan Fucetola, Corey P. Johnson, Jeremiah A. Berggren, Karl K. Massachusetts Institute of Technology. Department of Chemistry Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Korre, Hasan Fucetola, Corey P. Johnson, Jeremiah A. Berggren, Karl K. Interference lithography (IL) has proven itself to be an enabling technology for nanofabrication. Within IL, issues of spatial phase distortion, fringe stability, and substrate development have been explored and addressed. However, IL tools are still unnecessarily expensive, large, and complex. To address these issues, the authors previously built a simple IL tool that used a blue laser diode to produce ∼ 300 nm pitch structures. The resulting patterned areas ( ∼ mm[superscript 2]) were limited by both the temporal and spatial coherence of the laser. Here, the authors report on the advancement of their low-cost interference lithography tool that makes use of newly available blue laser diodes and a simplified spatial filter to print larger-area ( ∼ cm[superscript 2]) patterns. With this configuration, the authors have designed and implemented a small-footprint ( ∼ 0.2 m[superscript 2]) Lloyd’s mirror IL tool that can be assembled for less than ∼ 6000 USD. United States. Air Force Office of Scientific Research (FA9550-08-1-0379) Singapore-MIT Alliance for Research and Technology Center 2012-10-18T20:09:32Z 2012-10-18T20:09:32Z 2010-12 2010-07 Article http://purl.org/eprint/type/JournalArticle 1071-1023 1520-8567 http://hdl.handle.net/1721.1/74116 Korre, Hasan et al. “Development of a Simple, Compact, Low-cost Interference Lithography System.” Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 28.6 (2010): C6Q20. © 2010 American Vacuum Society https://orcid.org/0000-0002-8657-8537 https://orcid.org/0000-0001-7453-9031 https://orcid.org/0000-0001-9157-6491 en_US http://dx.doi.org/10.1116/1.3504498 Journal of Vacuum Science and Technology B Microelectronics and Nanometer Structures Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. application/pdf American Vacuum Society (AVS) MIT web domain |
| spellingShingle | Korre, Hasan Fucetola, Corey P. Johnson, Jeremiah A. Berggren, Karl K. Development of a simple, compact, low-cost interference lithography system |
| title | Development of a simple, compact, low-cost interference lithography system |
| title_full | Development of a simple, compact, low-cost interference lithography system |
| title_fullStr | Development of a simple, compact, low-cost interference lithography system |
| title_full_unstemmed | Development of a simple, compact, low-cost interference lithography system |
| title_short | Development of a simple, compact, low-cost interference lithography system |
| title_sort | development of a simple compact low cost interference lithography system |
| url | http://hdl.handle.net/1721.1/74116 https://orcid.org/0000-0002-8657-8537 https://orcid.org/0000-0001-7453-9031 https://orcid.org/0000-0001-9157-6491 |
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