Modeling the point-spread function in helium-ion lithography

Modeling the point-spread function in helium-ion lithography

We present here a hybrid approach to modeling helium-ion lithography that combines the power and ease-of-use of the Stopping and Range of Ions in Matter (SRIM) software with the results of recent work simulating secondary electron (SE) yield in helium-ion microscopy. This approach traces along SRIM-...

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Bibliographic Details
Main Authors: Winston, Donald, Ferrera, J., Battistella, L., Vladar, A. E., Berggren, Karl K.
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Format: Article
Language:en_US
Published: Wiley Blackwell 2012
Online Access:http://hdl.handle.net/1721.1/74145
https://orcid.org/0000-0001-7453-9031

Internet

http://hdl.handle.net/1721.1/74145
https://orcid.org/0000-0001-7453-9031

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