The Influence of Adjacent Segment on the Reliability of Cu Dual Damascene Interconnects
Three terminal âdotted-I’ interconnect structures, with vias at both ends and an additional via in the middle, were tested under various test conditions. Mortalities (failures) were found in right segments with jL value as low as 1250 A/cm, and the mortality of a dotted-I segment is dependent on t...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
2005
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| Subjects: | |
| Online Access: | http://hdl.handle.net/1721.1/7533 |
| _version_ | 1826211188444233728 |
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| author | Chang, Choon Wai Choi, Z.-S. Thompson, Carl V. Gan, C.L. Pey, Kin Leong Choi, Wee Kiong Hwang, N. |
| author_facet | Chang, Choon Wai Choi, Z.-S. Thompson, Carl V. Gan, C.L. Pey, Kin Leong Choi, Wee Kiong Hwang, N. |
| author_sort | Chang, Choon Wai |
| collection | MIT |
| description | Three terminal âdotted-I’ interconnect structures, with vias at both ends and an additional via in the middle, were tested under various test conditions. Mortalities (failures) were found in right segments with jL value as low as 1250 A/cm, and the mortality of a dotted-I segment is dependent on the direction and magnitude of the current in the adjacent segment. Some mortalities were also found in the right segments under a test condition where no failure was expected. Cu extrusion along the delaminated Cu/Si₃N₄ interface near the central via region was believed to cause the unexpected failures. From the time-to-failure (TTF), it is possible to quantify the Cu/Si₃N₄ interfacial strength and bonding energy. Hence, the demonstrated test methodology can be used to investigate the integrity of the Cu dual damascene processes. As conventionally determined critical jL values in two-terminal via-terminated lines cannot be directly applied to interconnects with branched segments, this also serves as a good methodology to identify the critical effective jL values for immortality. |
| first_indexed | 2024-09-23T15:01:59Z |
| format | Article |
| id | mit-1721.1/7533 |
| institution | Massachusetts Institute of Technology |
| language | English |
| last_indexed | 2024-09-23T15:01:59Z |
| publishDate | 2005 |
| record_format | dspace |
| spelling | mit-1721.1/75332019-04-13T00:09:43Z The Influence of Adjacent Segment on the Reliability of Cu Dual Damascene Interconnects Chang, Choon Wai Choi, Z.-S. Thompson, Carl V. Gan, C.L. Pey, Kin Leong Choi, Wee Kiong Hwang, N. Cu dual damascene processes terminal âdotted-I’ interconnect structures vias dotted-I segments copper silicon nitride Three terminal âdotted-I’ interconnect structures, with vias at both ends and an additional via in the middle, were tested under various test conditions. Mortalities (failures) were found in right segments with jL value as low as 1250 A/cm, and the mortality of a dotted-I segment is dependent on the direction and magnitude of the current in the adjacent segment. Some mortalities were also found in the right segments under a test condition where no failure was expected. Cu extrusion along the delaminated Cu/Si₃N₄ interface near the central via region was believed to cause the unexpected failures. From the time-to-failure (TTF), it is possible to quantify the Cu/Si₃N₄ interfacial strength and bonding energy. Hence, the demonstrated test methodology can be used to investigate the integrity of the Cu dual damascene processes. As conventionally determined critical jL values in two-terminal via-terminated lines cannot be directly applied to interconnects with branched segments, this also serves as a good methodology to identify the critical effective jL values for immortality. Singapore-MIT Alliance (SMA) 2005-01-26T12:00:00Z 2005-01-26T12:00:00Z 2005-01 Article http://hdl.handle.net/1721.1/7533 en Advanced Materials for Micro- and Nano-Systems (AMMNS); 13412 bytes application/pdf application/pdf |
| spellingShingle | Cu dual damascene processes terminal âdotted-I’ interconnect structures vias dotted-I segments copper silicon nitride Chang, Choon Wai Choi, Z.-S. Thompson, Carl V. Gan, C.L. Pey, Kin Leong Choi, Wee Kiong Hwang, N. The Influence of Adjacent Segment on the Reliability of Cu Dual Damascene Interconnects |
| title | The Influence of Adjacent Segment on the Reliability of Cu Dual Damascene Interconnects |
| title_full | The Influence of Adjacent Segment on the Reliability of Cu Dual Damascene Interconnects |
| title_fullStr | The Influence of Adjacent Segment on the Reliability of Cu Dual Damascene Interconnects |
| title_full_unstemmed | The Influence of Adjacent Segment on the Reliability of Cu Dual Damascene Interconnects |
| title_short | The Influence of Adjacent Segment on the Reliability of Cu Dual Damascene Interconnects |
| title_sort | influence of adjacent segment on the reliability of cu dual damascene interconnects |
| topic | Cu dual damascene processes terminal âdotted-I’ interconnect structures vias dotted-I segments copper silicon nitride |
| url | http://hdl.handle.net/1721.1/7533 |
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