Hall mobility of cuprous oxide thin films deposited by reactive direct-current magnetron sputtering
Cuprous oxide (Cu[subscript 2]O) is a promising earth-abundant semiconductor for photovoltaic applications. We report Hall mobilities of polycrystalline Cu[subscript 2]O thin films deposited by reactive dc magnetron sputtering. High substrate growth temperature enhances film grain structure and Hall...
| Main Authors: | , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
| Published: |
American Institute of Physics (AIP)
2013
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| Online Access: | http://hdl.handle.net/1721.1/78003 https://orcid.org/0000-0003-2785-552X https://orcid.org/0000-0001-8345-4937 |
| Summary: | Cuprous oxide (Cu[subscript 2]O) is a promising earth-abundant semiconductor for photovoltaic applications. We report Hall mobilities of polycrystalline Cu[subscript 2]O thin films deposited by reactive dc magnetron sputtering. High substrate growth temperature enhances film grain structure and Hall mobility. Temperature-dependent Hall mobilities measured on these films are comparable to monocrystalline Cu[subscript 2]O at temperatures above 250 K, reaching 62 cm[superscript 2]/V s at room temperature. At lower temperatures, the Hall mobility appears limited by carrier scattering from ionized centers. These observations indicate that sputtered Cu[subscript 2]O films at high substrate growth temperature may be suitable for thin-film photovoltaic applications. |
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