In situ study of hydrogen silsesquioxane dissolution rate in salty and electrochemical developers

In situ study of hydrogen silsesquioxane dissolution rate in salty and electrochemical developers

In order to better characterize the development of the electron-beam resist hydrogen silsesquioxane (HSQ), the authors used a quartz crystal microbalance (QCM) to study its rate of dissolution in situ. The authors determined the effect of both salt concentration and applied electric potential on the...

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Bibliographic Details
Main Authors: Harry, Katherine J., Strobel, Sebastian, Yang, Joel K. W., Duan, Huigao, Berggren, Karl K.
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Format: Article
Language:en_US
Published: American Vacuum Society 2013
Online Access:http://hdl.handle.net/1721.1/79832
https://orcid.org/0000-0001-7453-9031

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http://hdl.handle.net/1721.1/79832
https://orcid.org/0000-0001-7453-9031

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