Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO[subscript 2] Resists

Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO[subscript 2] Resists

To address the incompatibility of organic semiconductors with traditional photolithography, an inert, frozen CO[subscript 2] resist is demonstrated that forms an in situ shadow mask. Contact with a room-temperature micro-featured stamp is used to pattern the resist. After thin film deposition, the r...

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Bibliographic Details
Main Authors: Mendoza, Hiroshi A., Ashall, Daniel T., Yin, Allen S., Baldo, Marc A., Bahlke, Matthias Erhard
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Format: Article
Language:en_US
Published: Wiley Blackwell 2013
Online Access:http://hdl.handle.net/1721.1/82881
https://orcid.org/0000-0003-2201-5257

Internet

http://hdl.handle.net/1721.1/82881
https://orcid.org/0000-0003-2201-5257

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