Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO[subscript 2] Resists
To address the incompatibility of organic semiconductors with traditional photolithography, an inert, frozen CO[subscript 2] resist is demonstrated that forms an in situ shadow mask. Contact with a room-temperature micro-featured stamp is used to pattern the resist. After thin film deposition, the r...
| Main Authors: | , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
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Wiley Blackwell
2013
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| Online Access: | http://hdl.handle.net/1721.1/82881 https://orcid.org/0000-0003-2201-5257 |
| _version_ | 1811082463846334464 |
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| author | Mendoza, Hiroshi A. Ashall, Daniel T. Yin, Allen S. Baldo, Marc A. Bahlke, Matthias Erhard |
| author2 | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science |
| author_facet | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Mendoza, Hiroshi A. Ashall, Daniel T. Yin, Allen S. Baldo, Marc A. Bahlke, Matthias Erhard |
| author_sort | Mendoza, Hiroshi A. |
| collection | MIT |
| description | To address the incompatibility of organic semiconductors with traditional photolithography, an inert, frozen CO[subscript 2] resist is demonstrated that forms an in situ shadow mask. Contact with a room-temperature micro-featured stamp is used to pattern the resist. After thin film deposition, the remaining CO[subscript 2] is sublimed to lift off unwanted material. Pixel densities of 325 pixels-per-inch are shown. |
| first_indexed | 2024-09-23T12:03:49Z |
| format | Article |
| id | mit-1721.1/82881 |
| institution | Massachusetts Institute of Technology |
| language | en_US |
| last_indexed | 2024-09-23T12:03:49Z |
| publishDate | 2013 |
| publisher | Wiley Blackwell |
| record_format | dspace |
| spelling | mit-1721.1/828812022-09-27T23:49:37Z Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO[subscript 2] Resists Mendoza, Hiroshi A. Ashall, Daniel T. Yin, Allen S. Baldo, Marc A. Bahlke, Matthias Erhard Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Bahlke, Matthias Erhard Mendoza, Hiroshi A. Yin, Allen S. Baldo, Marc A. To address the incompatibility of organic semiconductors with traditional photolithography, an inert, frozen CO[subscript 2] resist is demonstrated that forms an in situ shadow mask. Contact with a room-temperature micro-featured stamp is used to pattern the resist. After thin film deposition, the remaining CO[subscript 2] is sublimed to lift off unwanted material. Pixel densities of 325 pixels-per-inch are shown. United States. Dept. of Energy. Office of Basic Energy Sciences (Award DE-SC0001088) MIT Energy Initiative (Graduate Fellowship in Energy) 2013-12-09T14:17:24Z 2013-12-09T14:17:24Z 2012-09 2012-08 Article http://purl.org/eprint/type/JournalArticle 09359648 1521-4095 http://hdl.handle.net/1721.1/82881 Bahlke, Matthias E., Hiroshi A. Mendoza, Daniel T. Ashall, Allen S. Yin, and Marc A. Baldo. “Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists.” Advanced Materials 24, no. 46 (December 4, 2012): 6136-6140. © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim https://orcid.org/0000-0003-2201-5257 en_US http://dx.doi.org/10.1002/adma.201202446 Advanced Materials http://creativecommons.org/licenses/by/2.5/ application/pdf Wiley Blackwell PMC |
| spellingShingle | Mendoza, Hiroshi A. Ashall, Daniel T. Yin, Allen S. Baldo, Marc A. Bahlke, Matthias Erhard Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO[subscript 2] Resists |
| title | Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO[subscript 2] Resists |
| title_full | Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO[subscript 2] Resists |
| title_fullStr | Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO[subscript 2] Resists |
| title_full_unstemmed | Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO[subscript 2] Resists |
| title_short | Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO[subscript 2] Resists |
| title_sort | dry lithography of large area thin film organic semiconductors using frozen co subscript 2 resists |
| url | http://hdl.handle.net/1721.1/82881 https://orcid.org/0000-0003-2201-5257 |
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