Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO[subscript 2] Resists
To address the incompatibility of organic semiconductors with traditional photolithography, an inert, frozen CO[subscript 2] resist is demonstrated that forms an in situ shadow mask. Contact with a room-temperature micro-featured stamp is used to pattern the resist. After thin film deposition, the r...
Main Authors: | Mendoza, Hiroshi A., Ashall, Daniel T., Yin, Allen S., Baldo, Marc A., Bahlke, Matthias Erhard |
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Other Authors: | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science |
Format: | Article |
Language: | en_US |
Published: |
Wiley Blackwell
2013
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Online Access: | http://hdl.handle.net/1721.1/82881 https://orcid.org/0000-0003-2201-5257 |
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