Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications
Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1999.
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| Format: | Thesis |
| Language: | eng |
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Massachusetts Institute of Technology
2014
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| Online Access: | http://hdl.handle.net/1721.1/85358 |
| _version_ | 1826216731118403584 |
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| author | Labelle, Catherine B., 1972- |
| author2 | Karen K. Gleason. |
| author_facet | Karen K. Gleason. Labelle, Catherine B., 1972- |
| author_sort | Labelle, Catherine B., 1972- |
| collection | MIT |
| description | Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1999. |
| first_indexed | 2024-09-23T16:52:11Z |
| format | Thesis |
| id | mit-1721.1/85358 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T16:52:11Z |
| publishDate | 2014 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/853582019-04-11T11:06:44Z Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications Labelle, Catherine B., 1972- Karen K. Gleason. Massachusetts Institute of Technology. Department of Chemical Engineering. Massachusetts Institute of Technology. Department of Chemical Engineering. Chemical Engineering. Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1999. Includes bibliographical references. by Catherine B. Labelle. Ph.D. 2014-03-06T15:36:10Z 2014-03-06T15:36:10Z 1999 1999 Thesis http://hdl.handle.net/1721.1/85358 45131356 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 310 leaves application/pdf Massachusetts Institute of Technology |
| spellingShingle | Chemical Engineering. Labelle, Catherine B., 1972- Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications |
| title | Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications |
| title_full | Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications |
| title_fullStr | Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications |
| title_full_unstemmed | Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications |
| title_short | Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications |
| title_sort | pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications |
| topic | Chemical Engineering. |
| url | http://hdl.handle.net/1721.1/85358 |
| work_keys_str_mv | AT labellecatherineb1972 pulsedplasmaenhancedchemicalvapordepositionoffluorocarbonthinfilmsfordielectricapplications |