Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications

Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications

Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1999.

Bibliographic Details
Main Author: Labelle, Catherine B., 1972-
Other Authors: Karen K. Gleason.
Format: Thesis
Language:eng
Published: Massachusetts Institute of Technology 2014
Subjects:
Chemical Engineering.
Online Access:http://hdl.handle.net/1721.1/85358

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