Direct fabrication of graphene on SiO[subscript 2] enabled by thin film stress engineering

Direct fabrication of graphene on SiO[subscript 2] enabled by thin film stress engineering

We demonstrate direct production of graphene on SiO[subscript 2] by CVD growth of graphene at the interface between a Ni film and the SiO[subscript 2] substrate, followed by dry mechanical delamination of the Ni using adhesive tape. This result is enabled by understanding of the competition between...

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Bibliographic Details
Main Authors: McNerny, Daniel Q., Viswanath, B., Copic, Davor, Laye, Fabrice R., Brieland-Shoultz, Anna C., Polsen, Erik S., Veerasamy, Vijayen S., Prohoda, Christophor George, Dee, Nicholas Thomas, Hart, Anastasios John
Other Authors: Massachusetts Institute of Technology. Department of Mechanical Engineering
Format: Article
Language:en_US
Published: Nature Publishing Group 2014
Online Access:http://hdl.handle.net/1721.1/88210
https://orcid.org/0000-0002-1532-2083
https://orcid.org/0000-0002-8633-3564
https://orcid.org/0000-0002-7372-3512

Internet

http://hdl.handle.net/1721.1/88210
https://orcid.org/0000-0002-1532-2083
https://orcid.org/0000-0002-8633-3564
https://orcid.org/0000-0002-7372-3512

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