Particle generation in a chemical vapor deposition/plasma-enhanced chemical vapor deposition interlayer dielectric tool
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1998.
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| Format: | Thesis |
| Language: | eng |
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Massachusetts Institute of Technology
2005
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| Online Access: | http://hdl.handle.net/1721.1/8992 |
| _version_ | 1826207063397629952 |
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| author | Haberer, Elaine D. (Elaine Denise), 1975- |
| author2 | L.C. Kimerling. |
| author_facet | L.C. Kimerling. Haberer, Elaine D. (Elaine Denise), 1975- |
| author_sort | Haberer, Elaine D. (Elaine Denise), 1975- |
| collection | MIT |
| description | Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1998. |
| first_indexed | 2024-09-23T13:42:54Z |
| format | Thesis |
| id | mit-1721.1/8992 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T13:42:54Z |
| publishDate | 2005 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/89922019-04-12T09:19:42Z Particle generation in a chemical vapor deposition/plasma-enhanced chemical vapor deposition interlayer dielectric tool Haberer, Elaine D. (Elaine Denise), 1975- L.C. Kimerling. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. Materials Science and Engineering. Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1998. Includes bibliographical references (p. 77-79). The interlayer dielectric plays an important role in multilevel integration. Material choice, processing, and contamination greatly impact the performance of the layer. In this study, particle generation, deposition, and adhesion mechanisms are reviewed. In particular, four important sources of interlayer dielectric particle contamination were investigated: the cleanroom environment, improper wafer handling, the backside of the wafer, and microarcing during process. by Elaine D. Haberer. S.M. 2005-09-27T19:45:16Z 2005-09-27T19:45:16Z 1998 1998 Thesis http://hdl.handle.net/1721.1/8992 47264889 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 79 p. 5662129 bytes 5661889 bytes application/pdf application/pdf application/pdf Massachusetts Institute of Technology |
| spellingShingle | Materials Science and Engineering. Haberer, Elaine D. (Elaine Denise), 1975- Particle generation in a chemical vapor deposition/plasma-enhanced chemical vapor deposition interlayer dielectric tool |
| title | Particle generation in a chemical vapor deposition/plasma-enhanced chemical vapor deposition interlayer dielectric tool |
| title_full | Particle generation in a chemical vapor deposition/plasma-enhanced chemical vapor deposition interlayer dielectric tool |
| title_fullStr | Particle generation in a chemical vapor deposition/plasma-enhanced chemical vapor deposition interlayer dielectric tool |
| title_full_unstemmed | Particle generation in a chemical vapor deposition/plasma-enhanced chemical vapor deposition interlayer dielectric tool |
| title_short | Particle generation in a chemical vapor deposition/plasma-enhanced chemical vapor deposition interlayer dielectric tool |
| title_sort | particle generation in a chemical vapor deposition plasma enhanced chemical vapor deposition interlayer dielectric tool |
| topic | Materials Science and Engineering. |
| url | http://hdl.handle.net/1721.1/8992 |
| work_keys_str_mv | AT habererelainedelainedenise1975 particlegenerationinachemicalvapordepositionplasmaenhancedchemicalvapordepositioninterlayerdielectrictool |