Design, fabrication, and characterization of a compact deep reactive ion etching system for MEMS processing

Thesis: S.M., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 2014.

Detalhes bibliográficos
Principais autores:	Gould, Parker Andrew, Hsing, Mitchell David
Outros Autores:	Martin A. Schmidt.
Formato:	Tese
Idioma:	eng
Publicado em:	Massachusetts Institute of Technology 2015
Assuntos:	Electrical Engineering and Computer Science.
Acesso em linha:	http://hdl.handle.net/1721.1/93835

Internet

http://hdl.handle.net/1721.1/93835