Zone plate array lithography in the deep UV
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1998.
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| Format: | Thesis |
| Language: | eng |
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Massachusetts Institute of Technology
2005
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| Online Access: | http://hdl.handle.net/1721.1/9626 |
| _version_ | 1811096171920228352 |
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| author | Djomehri, Ihsan Jahed, 1976- |
| author2 | Henry I. Smith. |
| author_facet | Henry I. Smith. Djomehri, Ihsan Jahed, 1976- |
| author_sort | Djomehri, Ihsan Jahed, 1976- |
| collection | MIT |
| description | Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1998. |
| first_indexed | 2024-09-23T16:39:15Z |
| format | Thesis |
| id | mit-1721.1/9626 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T16:39:15Z |
| publishDate | 2005 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/96262020-07-14T22:12:30Z Zone plate array lithography in the deep UV ZPAL Djomehri, Ihsan Jahed, 1976- Henry I. Smith. Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Electrical Engineering and Computer Science Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1998. Includes bibliographical references (p. 47). Initial design and development of a new paradigm in nanolithography, zone plate array lithography (ZPAL), has yielded a clearer understanding of its operation, construction, and performance. The benefits of ZPAL as a maskless strategy to write arbitrary patterns with ~ 25 nm resolution are explored. To optimize the properties of the system required proper design of zone plate focusing. Due to ZPAL's universality, the study has been conducted in the deep UV; a process to create zone plates with 250 nm theoretical spots sizes for this regime was developed. Familiarity with nanofabrication technology proved essential, especially e-beam lithography. Next, an optical setup was built replete with alignment interferometry, precision stage motion, and radiation from a 193 nm ArF laser. A rubric for the implementation of the multiplexing coupled with coordination architecture demonstrated a potentially high throughput of l cm2 / s. Moreover, the results of exposure tests show digital pattern generation from an array of beamlets. Because the ideal ZPAL system would function with x-rays, a discussion on its design and practical development has been included. Despite anticipated hurdles, spearheading this venture promises to drive lithography to its limit. by Ihsan Jahed Djomehri. S.M. 2005-08-19T19:02:03Z 2005-08-19T19:02:03Z 1998 1998 Thesis http://hdl.handle.net/1721.1/9626 42306172 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 47 p. 3956031 bytes 3955789 bytes application/pdf application/pdf application/pdf Massachusetts Institute of Technology |
| spellingShingle | Electrical Engineering and Computer Science Djomehri, Ihsan Jahed, 1976- Zone plate array lithography in the deep UV |
| title | Zone plate array lithography in the deep UV |
| title_full | Zone plate array lithography in the deep UV |
| title_fullStr | Zone plate array lithography in the deep UV |
| title_full_unstemmed | Zone plate array lithography in the deep UV |
| title_short | Zone plate array lithography in the deep UV |
| title_sort | zone plate array lithography in the deep uv |
| topic | Electrical Engineering and Computer Science |
| url | http://hdl.handle.net/1721.1/9626 |
| work_keys_str_mv | AT djomehriihsanjahed1976 zoneplatearraylithographyinthedeepuv AT djomehriihsanjahed1976 zpal |