Precision six degrees of freedom magnetically-levitated photolithography stage
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1998.
| Main Author: | |
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| Other Authors: | |
| Format: | Thesis |
| Language: | eng |
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Massachusetts Institute of Technology
2005
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| Online Access: | http://hdl.handle.net/1721.1/9850 |
| _version_ | 1826190334910005248 |
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| author | Williams, Mark E. (Mark Edd) |
| author2 | David L. Trumper. |
| author_facet | David L. Trumper. Williams, Mark E. (Mark Edd) |
| author_sort | Williams, Mark E. (Mark Edd) |
| collection | MIT |
| description | Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1998. |
| first_indexed | 2024-09-23T08:38:22Z |
| format | Thesis |
| id | mit-1721.1/9850 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T08:38:22Z |
| publishDate | 2005 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/98502019-04-09T18:56:22Z Precision six degrees of freedom magnetically-levitated photolithography stage Williams, Mark E. (Mark Edd) David L. Trumper. Massachusetts Institute of Technology. Dept. of Mechanical Engineering Mechanical Engineering Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1998. Includes bibliographical references (leaves 221-225). by Mark Edd Williams. Ph.D. 2005-08-19T16:18:31Z 2005-08-19T16:18:31Z 1997 1998 Thesis http://hdl.handle.net/1721.1/9850 41357016 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 257 leaves 15235679 bytes 15235432 bytes application/pdf application/pdf application/pdf Massachusetts Institute of Technology |
| spellingShingle | Mechanical Engineering Williams, Mark E. (Mark Edd) Precision six degrees of freedom magnetically-levitated photolithography stage |
| title | Precision six degrees of freedom magnetically-levitated photolithography stage |
| title_full | Precision six degrees of freedom magnetically-levitated photolithography stage |
| title_fullStr | Precision six degrees of freedom magnetically-levitated photolithography stage |
| title_full_unstemmed | Precision six degrees of freedom magnetically-levitated photolithography stage |
| title_short | Precision six degrees of freedom magnetically-levitated photolithography stage |
| title_sort | precision six degrees of freedom magnetically levitated photolithography stage |
| topic | Mechanical Engineering |
| url | http://hdl.handle.net/1721.1/9850 |
| work_keys_str_mv | AT williamsmarkemarkedd precisionsixdegreesoffreedommagneticallylevitatedphotolithographystage |