Three-dimensional nanofabrication using HSQ/PMMA bilayer resists
In this work, the authors developed two processes for fabricating three-dimensional (3D) nanostructures using a hydrogen silsesquioxane and poly(methylmethacrylate) bilayer resist stack. The resist stack was patterned in a single electron-beam writing step without removing the wafer. The resulting 3...
| Main Authors: | , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
| Published: |
American Vacuum Society (AVS)
2015
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| Online Access: | http://hdl.handle.net/1721.1/99750 https://orcid.org/0000-0003-3219-5474 https://orcid.org/0000-0001-7453-9031 https://orcid.org/0000-0003-2055-4900 |