Microphotoluminescence investigation of InAs quantum dot active region in 1.3 μm vertical cavity surface emitting laser structure

Microphotoluminescence -PL investigation has been performed at room temperature on InAs quantum dot QD vertical cavity surface emitting laser VCSEL structure in order to characterize the QD epitaxial structure which was designed for 1.3 m wave band emission. Actual and precise QD emission...

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Main Authors: Ding, Y., Ma, B. S., Xu, D. W., Liang, S., Zhao, L. J., Wasiak, M., Czyszanowski, T., Nakwaski, W., Fan, Weijun, Yoon, Soon Fatt
Other Authors: School of Electrical and Electronic Engineering
Format: Journal Article
Language:English
Published: 2013
Subjects:
Online Access:https://hdl.handle.net/10356/100797
http://hdl.handle.net/10220/18171
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author Ding, Y.
Ma, B. S.
Xu, D. W.
Liang, S.
Zhao, L. J.
Wasiak, M.
Czyszanowski, T.
Nakwaski, W.
Fan, Weijun
Yoon, Soon Fatt
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Ding, Y.
Ma, B. S.
Xu, D. W.
Liang, S.
Zhao, L. J.
Wasiak, M.
Czyszanowski, T.
Nakwaski, W.
Fan, Weijun
Yoon, Soon Fatt
author_sort Ding, Y.
collection NTU
description Microphotoluminescence -PL investigation has been performed at room temperature on InAs quantum dot QD vertical cavity surface emitting laser VCSEL structure in order to characterize the QD epitaxial structure which was designed for 1.3 m wave band emission. Actual and precise QD emission spectra including distinct ground state GS and excited state ES transition peaks are obtained by an edge-excitation and edge-emission EEEE -PL configuration. Conventional photoluminescence methods for QD-VCSELs structure analysis are compared and discussed, which indicate the EEEE -PL is a useful tool to determine the optical features of the QD active region in an as-grown VCSEL structure. Some experimental results have been compared with simulation results obtained with the aid of the plane-wave admittance method. After adjustment of epitaxial growth according to EEEE -PL measurement results, QD-VCSEL structure wafer with QD GS transition wavelength of 1300 nm and lasing wavelength of 1301 nm was obtained.
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spelling ntu-10356/1007972020-03-07T14:00:32Z Microphotoluminescence investigation of InAs quantum dot active region in 1.3 μm vertical cavity surface emitting laser structure Ding, Y. Ma, B. S. Xu, D. W. Liang, S. Zhao, L. J. Wasiak, M. Czyszanowski, T. Nakwaski, W. Fan, Weijun Yoon, Soon Fatt School of Electrical and Electronic Engineering Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy 3Institute of Physics, Technical University of Lodz, ul. Wolczanska DRNTU::Engineering::Electrical and electronic engineering Microphotoluminescence -PL investigation has been performed at room temperature on InAs quantum dot QD vertical cavity surface emitting laser VCSEL structure in order to characterize the QD epitaxial structure which was designed for 1.3 m wave band emission. Actual and precise QD emission spectra including distinct ground state GS and excited state ES transition peaks are obtained by an edge-excitation and edge-emission EEEE -PL configuration. Conventional photoluminescence methods for QD-VCSELs structure analysis are compared and discussed, which indicate the EEEE -PL is a useful tool to determine the optical features of the QD active region in an as-grown VCSEL structure. Some experimental results have been compared with simulation results obtained with the aid of the plane-wave admittance method. After adjustment of epitaxial growth according to EEEE -PL measurement results, QD-VCSEL structure wafer with QD GS transition wavelength of 1300 nm and lasing wavelength of 1301 nm was obtained. Published version 2013-12-09T01:39:03Z 2019-12-06T20:28:27Z 2013-12-09T01:39:03Z 2019-12-06T20:28:27Z 2010 2010 Journal Article Ding, Y., Fan, W., Ma, B. S., Xu, D. W., Yoon, S. F., Liang, S., Zhao, L. J., Wasiak, M., Czyszanowski, T.,& Nakwaski, W. (2010). Microphotoluminescence investigation of InAs quantum dot active region in 1.3 μm vertical cavity surface emitting laser structure. Journal of applied physics, 108, 073111. 0021-8979 https://hdl.handle.net/10356/100797 http://hdl.handle.net/10220/18171 10.1063/1.3490236 en Journal of applied physics © 2010 American Institute of Physics. This paper was published in Journal of Applied Physics and is made available as an electronic reprint (preprint) with permission of American Institute of Physics. The paper can be found at the following official DOI: http://dx.doi.org/10.1063/1.3490236.  One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law. 5 p. application/pdf
spellingShingle DRNTU::Engineering::Electrical and electronic engineering
Ding, Y.
Ma, B. S.
Xu, D. W.
Liang, S.
Zhao, L. J.
Wasiak, M.
Czyszanowski, T.
Nakwaski, W.
Fan, Weijun
Yoon, Soon Fatt
Microphotoluminescence investigation of InAs quantum dot active region in 1.3 μm vertical cavity surface emitting laser structure
title Microphotoluminescence investigation of InAs quantum dot active region in 1.3 μm vertical cavity surface emitting laser structure
title_full Microphotoluminescence investigation of InAs quantum dot active region in 1.3 μm vertical cavity surface emitting laser structure
title_fullStr Microphotoluminescence investigation of InAs quantum dot active region in 1.3 μm vertical cavity surface emitting laser structure
title_full_unstemmed Microphotoluminescence investigation of InAs quantum dot active region in 1.3 μm vertical cavity surface emitting laser structure
title_short Microphotoluminescence investigation of InAs quantum dot active region in 1.3 μm vertical cavity surface emitting laser structure
title_sort microphotoluminescence investigation of inas quantum dot active region in 1 3 μm vertical cavity surface emitting laser structure
topic DRNTU::Engineering::Electrical and electronic engineering
url https://hdl.handle.net/10356/100797
http://hdl.handle.net/10220/18171
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