Flexible nanoscale memory device based on resistive switching in nickel oxide thin film

In this work, a flexible memory device based on resistive switching in a NiO thin film has been demonstrated. A large memory window with the resistance ratio of ∼103 between the high-resistance state and the low-resistance state is observed. A memory state can be altered by either voltage pulses or...

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Main Authors: Yu, Q., Hu, S. G., Deng, L. J., Liu, Y., Lim, Wei Meng, Chen, Tupei
Other Authors: School of Electrical and Electronic Engineering
Format: Journal Article
Language:English
Published: 2013
Subjects:
Online Access:https://hdl.handle.net/10356/101075
http://hdl.handle.net/10220/13694
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author Yu, Q.
Hu, S. G.
Deng, L. J.
Liu, Y.
Lim, Wei Meng
Chen, Tupei
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Yu, Q.
Hu, S. G.
Deng, L. J.
Liu, Y.
Lim, Wei Meng
Chen, Tupei
author_sort Yu, Q.
collection NTU
description In this work, a flexible memory device based on resistive switching in a NiO thin film has been demonstrated. A large memory window with the resistance ratio of ∼103 between the high-resistance state and the low-resistance state is observed. A memory state can be altered by either voltage pulses or a voltage sweeping. The memory window can be maintained in repetitive programming/erase cycles (at least 120 cycles have been demonstrated in the present experiment), showing a good endurance. In addition, in the time frame (104 s) of the retention experiment, no significant degradation in the memory window is observed, demonstrating a good retention capability.
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spelling ntu-10356/1010752020-03-07T14:00:34Z Flexible nanoscale memory device based on resistive switching in nickel oxide thin film Yu, Q. Hu, S. G. Deng, L. J. Liu, Y. Lim, Wei Meng Chen, Tupei School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering In this work, a flexible memory device based on resistive switching in a NiO thin film has been demonstrated. A large memory window with the resistance ratio of ∼103 between the high-resistance state and the low-resistance state is observed. A memory state can be altered by either voltage pulses or a voltage sweeping. The memory window can be maintained in repetitive programming/erase cycles (at least 120 cycles have been demonstrated in the present experiment), showing a good endurance. In addition, in the time frame (104 s) of the retention experiment, no significant degradation in the memory window is observed, demonstrating a good retention capability. 2013-09-25T07:26:35Z 2019-12-06T20:33:06Z 2013-09-25T07:26:35Z 2019-12-06T20:33:06Z 2012 2012 Journal Article Yu, Q., Lim, W. M., Hu, S. G., Chen, T., Deng, L. J., & Liu, Y. (2012). Flexible nanoscale memory device based on resistive switching in nickel oxide thin film. Nanoscience and nanotechnology letters, 4(9), 940-943(4). https://hdl.handle.net/10356/101075 http://hdl.handle.net/10220/13694 10.1166/nnl.2012.1398 en Nanoscience and nanotechnology letters
spellingShingle DRNTU::Engineering::Electrical and electronic engineering
Yu, Q.
Hu, S. G.
Deng, L. J.
Liu, Y.
Lim, Wei Meng
Chen, Tupei
Flexible nanoscale memory device based on resistive switching in nickel oxide thin film
title Flexible nanoscale memory device based on resistive switching in nickel oxide thin film
title_full Flexible nanoscale memory device based on resistive switching in nickel oxide thin film
title_fullStr Flexible nanoscale memory device based on resistive switching in nickel oxide thin film
title_full_unstemmed Flexible nanoscale memory device based on resistive switching in nickel oxide thin film
title_short Flexible nanoscale memory device based on resistive switching in nickel oxide thin film
title_sort flexible nanoscale memory device based on resistive switching in nickel oxide thin film
topic DRNTU::Engineering::Electrical and electronic engineering
url https://hdl.handle.net/10356/101075
http://hdl.handle.net/10220/13694
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