Large scale low cost fabrication of diameter controllable silicon nanowire arrays
We report on a novel solution etching method to fabricate vertically aligned aperiodic silicon nanowire (SiNW) arrays. We begin with a simple dewetting process to fabricate a monolayer of well-spaced metal particles in situ on a silicon wafer. The particles function as a sacrificial template to patt...
| Principais autores: | , , , , |
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| Outros Autores: | |
| Formato: | Journal Article |
| Idioma: | English |
| Publicado em: |
2014
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| Assuntos: | |
| Acesso em linha: | https://hdl.handle.net/10356/103458 http://hdl.handle.net/10220/24497 |