An experimental study of lateral charge transfer in silicon nanocrystal layer embedded in SiO2 thin film

An experimental study of lateral charge transfer in silicon nanocrystal layer embedded in SiO2 thin film

Lateral charge transfer in a Si nanocrystal (nc-Si) layer embedded in a SiO2 thin film synthesized by Si ion implantation is investigated. When the nc-Si in one metal-oxide-semiconductor device is charged, the charging effect on both the charged device itself and the neighboring devices is monitored...

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Bibliographic Details
Main Authors: Wong, J. I., Chen, T. P., Tay, Y. Y., Liu, P., Yang, M., Liu, Z., Yang, H. Y.
Other Authors: School of Electrical and Electronic Engineering
Format: Journal Article
Language:English
Published: 2015
Subjects:
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Online Access:https://hdl.handle.net/10356/103957
http://hdl.handle.net/10220/24654

Internet

https://hdl.handle.net/10356/103957
http://hdl.handle.net/10220/24654

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