Effect of annealing temperature on microstructure and UV light photocatalytic activity of TiO2 films grown by atmospheric pressure CVD

Effect of annealing temperature on microstructure and UV light photocatalytic activity of TiO2 films grown by atmospheric pressure CVD

Titanium dioxide (TiO2) films are deposited on quartz substrates by atmospheric pressure (AP)CVD, and then annealed under simulated air (80% nitrogen, 20% oxygen) at temperatures from 600 to 900 °C to investigate the change in microstructure and the effect on the photocatalytic activity on the simul...

Full description

Bibliographic Details
Main Authors: Soutar, Andrew McIntosh, Ding, Xingzhao, Chua, Chin Sheng, Fang, Xiaoqin, Chen, Xiaofeng, Tan, Ooi Kiang, Tse, Man Siu
Other Authors: School of Electrical and Electronic Engineering
Format: Journal Article
Language:English
Published: 2015
Subjects:
DRNTU::Science::Chemistry
DRNTU::Science::Chemistry::Crystallography::Chemical crystallography
Online Access:https://hdl.handle.net/10356/106685
http://hdl.handle.net/10220/25098
http://dx.doi.org/10.1002/cvde.201207015

Internet

https://hdl.handle.net/10356/106685
http://hdl.handle.net/10220/25098
http://dx.doi.org/10.1002/cvde.201207015

Similar Items