Effect of annealing temperature on microstructure and UV light photocatalytic activity of TiO2 films grown by atmospheric pressure CVD
Titanium dioxide (TiO2) films are deposited on quartz substrates by atmospheric pressure (AP)CVD, and then annealed under simulated air (80% nitrogen, 20% oxygen) at temperatures from 600 to 900 °C to investigate the change in microstructure and the effect on the photocatalytic activity on the simul...
Main Authors: | Soutar, Andrew McIntosh, Ding, Xingzhao, Chua, Chin Sheng, Fang, Xiaoqin, Chen, Xiaofeng, Tan, Ooi Kiang, Tse, Man Siu |
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Other Authors: | School of Electrical and Electronic Engineering |
Format: | Journal Article |
Language: | English |
Published: |
2015
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/106685 http://hdl.handle.net/10220/25098 http://dx.doi.org/10.1002/cvde.201207015 |
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